#에프에스티 #CNT펠리클 #SPIE
내일 시장 열면 안 되나?
https://spie.org/advanced-lithography/presentation/manufacturing-ready-and-supporting-infrastructure-for-successful-adoption-of-EUV/13979-107
we demonstrate that CNT pellicles meeting EUV pellicle specifications can be applied to the lithography steps in 2 nm node devices. The resulting process delivers high fidelity pattern transfer while effectively protecting mask surfaces from particle contamination during EUV scanner exposures
Presenter
Jae Hyuck Choi
Fine Semite h Co., Ltd. (Korea, Republic of)
Dr. Choi has been charged for EUV Pellicle development and production at FST since 2020. Before he joined FST, he used to work for Samsung photomask development team, Zeiss and then KLA Tencor.
내일 시장 열면 안 되나?
https://spie.org/advanced-lithography/presentation/manufacturing-ready-and-supporting-infrastructure-for-successful-adoption-of-EUV/13979-107